AppliTek’s analytical solutions for efficient wet etching processes can be used in the semiconductor industry where latest generation fabs have only accelerated the needs for process monitoring. With the increased speed of processing, precise chemical concentration control is becoming crucial to wafer processing in order to obtain consistency and more cost-effective manufacturing of integrated circuits.
Intelligent control systems to determine process end point are not new to modern semiconductor manufacturing, but include mostly physical parameters such as pH, flow, temperature and turbidity. Concentration of the individual agents, if it is determined, is often restrained to manual, labour-intensive and time-consuming measurements that cannot provide process transparency.
On-line monitoring of the electrolyte bath composition is the solution by excellence to maintaining the electrolyte bath components in proportion. AppliTek’s on-line analyzer systems meet the demands of analytical precision, repeatability and robustness, comparable to laboratory output.